Title:
PHOTOSENSITIVE MATERIAL, PHOTOSENSITIVE-MATERIAL PRECURSOR, AND PROCESS FOR PRODUCING PHOTOSENSITIVE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2010/113777
Kind Code:
A1
Abstract:
A photosensitive material which comprises a polymer matrix including a cyclic oligosaccharide derivative as a structural unit, a radical-polymerizable monomer, and a free-radical photopolymerization initiator.
Inventors:
SHIMIZU TAKEHIRO (JP)
TANIGUCHI YUICHI (JP)
MASAKI KAZUYOSHI (JP)
ANDO TOSHIO (JP)
SHICHIJO YASUJI (JP)
TANIGUCHI YUICHI (JP)
MASAKI KAZUYOSHI (JP)
ANDO TOSHIO (JP)
SHICHIJO YASUJI (JP)
Application Number:
PCT/JP2010/055319
Publication Date:
October 07, 2010
Filing Date:
March 26, 2010
Export Citation:
Assignee:
NIPPON STEEL CHEMICAL CO (JP)
SHIMIZU TAKEHIRO (JP)
TANIGUCHI YUICHI (JP)
MASAKI KAZUYOSHI (JP)
ANDO TOSHIO (JP)
SHICHIJO YASUJI (JP)
SHIMIZU TAKEHIRO (JP)
TANIGUCHI YUICHI (JP)
MASAKI KAZUYOSHI (JP)
ANDO TOSHIO (JP)
SHICHIJO YASUJI (JP)
International Classes:
C08F2/44; C08F20/26; C08F212/34; G03H1/02
Domestic Patent References:
| WO2008096712A1 | 2008-08-14 |
Foreign References:
| JP2007238665A | 2007-09-20 | |||
| JP2006003388A | 2006-01-05 | |||
| JP2010020260A | 2010-01-28 |
Attorney, Agent or Firm:
SAKURA PATENT OFFICE, p. c. (JP)
Patent business corporation cherry tree international patent firm (JP)
Patent business corporation cherry tree international patent firm (JP)
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