PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF

Title:

PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF

Document Type and Number:

WIPO Patent Application WO/2002/019037

Kind Code:

A1

Abstract:

A positive photosensitive polysilazane composition which comprises: a modified polysilsesquiazane having basic structural units represented by the general formula -[SiR?6¿(NR?7¿)¿1.5?]-, containing other structural units represented by the general formula -[SiR?6¿¿2?NR?7¿]- and/or [SiR?6¿¿3?(NR?7¿)¿0.5?]- in an amount of 0.1 to 100 mol% based on the basic structural units, and having a number-average molecular weight of 100 to 100,000 (in the formulae, R?6¿ and R?7¿ each independently represents hydrogen, C¿1-3? alkyl, or (un)substituted phenyl); and a photo-acid generator. It preferably contains a water-soluble compound as a shape stabilizer. The composition is applied to a substrate and pattern-wise exposed to light. The coating film exposed is moistened and then developed with an aqueous alkali solution. The resultant pattern is wholly exposed to light, subsequently moistened again, and then burned. Thus, a fine silica-based ceramic film which has satisfactory properties and is suitable as an interlayer dielectric is formed in a short time.

Inventors:

NAGAHARA TATSURO (JP)
MATSUO HIDEKI (JP)

Application Number:

PCT/JP2001/007251

Publication Date:

March 07, 2002

Filing Date:

August 24, 2001

Export Citation:

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Assignee:

CLARIANT INT LTD (CH)
NAGAHARA TATSURO (JP)
MATSUO HIDEKI (JP)

International Classes:

C08K5/42; C08L83/16; C09D183/16; G03F7/004; G03F7/075; G03F7/38; (IPC1-7): G03F7/38; G03F7/40; G03F7/075; G03F7/004; C08L83/16; C08K5/3492; C08K5/42

Foreign References:

JP2000181069A	2000-06-30
JPH10319597A	1998-12-04
JPH11269229A	1999-10-05
JPH10186663A	1998-07-14
JPS5258374A	1977-05-13

Other References: