Title:
PHOTOSENSITIVE REFRACTIVE INDEX MODULATION FILM, METHOD FOR FORMING CURED FILM PATTERN, CURED FILM AND ELECTRONIC COMPONENT
Document Type and Number:
WIPO Patent Application WO/2017/175642
Kind Code:
A1
Abstract:
This photosensitive refractive index modulation film is provided with: a supporting film; a first resin layer which is provided on the supporting film and contains a di(meth)acrylate compound having a dicyclopentanyl structure or a dicyclopentenyl structure; and a second resin layer which is provided on the first resin layer and contains metal oxide particles and a polymer having an acid value of 150 mgKOH/g or more.
Inventors:
WATANABE TAKUMI (JP)
WATANABE KAZUHITO (JP)
SATO MAYUMI (JP)
OZAWA MASAYOSHI (JP)
WATANABE KAZUHITO (JP)
SATO MAYUMI (JP)
OZAWA MASAYOSHI (JP)
Application Number:
PCT/JP2017/012966
Publication Date:
October 12, 2017
Filing Date:
March 29, 2017
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD (JP)
International Classes:
G03F7/004; B32B7/02; B32B27/30; G03F7/027; G03F7/031; G03F7/033; G03F7/11; G06F3/041
Domestic Patent References:
| WO2016136329A1 | 2016-09-01 |
Foreign References:
| JP2015173153A | 2015-10-01 | |||
| JP2011164305A | 2011-08-25 | |||
| JP2005300857A | 2005-10-27 | |||
| JP2008306073A | 2008-12-18 |
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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