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Title:
PHOTOSENSITIVE RESIN COMPOSITION, AND ANTIREFLECTION FILM AND ANTIREFLECTIVE HARD COATING FILM WHICH ARE PRODUCED USING SAME
Document Type and Number:
WIPO Patent Application WO/2011/013611
Kind Code:
A1
Abstract:
Provided is a photosensitive resin composition which can be easily cured by means of active energy rays. The photosensitive composition can provide a cured product which exhibits high hardness, and excellent scratch resistance, adhesion, chemical resistance, stain resistance (such as removability of marker pen ink or fingerprints by rubbing), and transparency, and which has a low refractive index. Further, an antireflection film produced using the photosensitive resin composition exhibits a low reflectivity. Also provided are an antireflection film and an antireflective hard coating film, which have films prepared by curing the resin composition. A photosensitive resin composition which comprises (A) a polyfunctional (meth)acrylate having at least three (meth)acryloyl groups in the molecule, (B) colloidal silica that has a nanoporous structure with a mean particle diameter of 1 to 200 nm, and (C) a (meth)acryloyl-containing polysiloxane, and (D) a photo-radical polymerization initiator.

Inventors:
YAHAGI Yoshiyuki (31-12 Shimo 3-chome, Kita-k, Tokyo 88, 〒1158588, JP)
矢作 悦幸 (〒88 東京都北区志茂3-31-12 日本化薬株式会社 機能化学品研究所内 Tokyo, 〒1158588, JP)
Application Number:
JP2010/062511
Publication Date:
February 03, 2011
Filing Date:
July 26, 2010
Export Citation:
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Assignee:
NIPPON KAYAKU KABUSHIKI KAISHA (11-2, Fujimi 1-chome Chiyoda-k, Tokyo 72, 〒1028172, JP)
日本化薬株式会社 (〒72 東京都千代田区富士見一丁目11番2号 Tokyo, 〒1028172, JP)
YAHAGI Yoshiyuki (31-12 Shimo 3-chome, Kita-k, Tokyo 88, 〒1158588, JP)
International Classes:
C08F290/06; C08J7/04; G02B1/10; G02B1/11
Attorney, Agent or Firm:
IWASE Yoshikazu et al. (Anderson Mori & Tomotsune, Izumi Garden Tower 6-1, Roppongi 1-chom, Minato-ku Tokyo 36, 〒1066036, JP)
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