Title:
PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAYERED PRODUCT, METHOD FOR PRODUCING CURED FILM, SEMICONDUCTOR DEVICE, AND THERMOBASE GENERATOR
Document Type and Number:
WIPO Patent Application WO/2020/066435
Kind Code:
A1
Abstract:
A novel thermobase generator is provided to increase the kinds of materials usable in the field of photosensitive resin compositions containing a specific polymer precursor. Provided are: a photosensitive resin composition which, according to need, can not only have excellent storage stability but also give cured films having excellent mechanical properties; a cured film; a layered product; a method for producing the cured film; and the thermobase generator. The photosensitive resin composition comprises at least one polymer precursor selected from the group consisting of polyimide precursors and polybenzoxazole precursors, a specific thermobase generator, and a photosensitizer.
Inventors:
FUKUHARA TOSHIAKI (JP)
SHIMADA KAZUTO (JP)
YOSHIDA KENTA (JP)
SHIMADA KAZUTO (JP)
YOSHIDA KENTA (JP)
Application Number:
PCT/JP2019/033659
Publication Date:
April 02, 2020
Filing Date:
August 28, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; C08G73/12; C08G73/22; G03F7/037; G03F7/038
Domestic Patent References:
| WO2015099219A1 | 2015-07-02 |
Foreign References:
| JP2016212380A | 2016-12-15 | |||
| JP2010061087A | 2010-03-18 | |||
| JPH07146558A | 1995-06-06 | |||
| JP2013029619A | 2013-02-07 |
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
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