Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION, DISPLAY DEVICE, AND A METHOD FOR PREPARING PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2020/082480
Kind Code:
A1
Abstract:
A photosensitive resin composition, a method for preparing the photosensitive resin composition, and a display device comprising the photosensitive resin composition. The photosensitive resin composition particularly relates to a photosensitive resin composition applied to the technical field of flexible display devices, and comprises: 5-50 parts by weight of an acrylate cross-linking monomer (1), 0.2-0.6 parts by weight of an initiator (2), 5-8 parts by weight of a pigment liquid-solid matter (3), 5-8 parts by weight of resin (4), and 20-70 parts by weight of a solvent (5), wherein the initiator (2) is a free radical initiator with a decomposition temperature lower than 40°C, and the acrylate cross-linking monomer is formed by copolymerizing two acrylate polymerization monomer molecules containing aromatic rings and trihydric alcohol. The temperature of a subsequent color filter manufacturing process is reduced.

Inventors:
GONG WENLIANG (CN)
Application Number:
PCT/CN2018/116906
Publication Date:
April 30, 2020
Filing Date:
November 22, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
G03F7/027; G02B5/20
Foreign References:
CN101416112A2009-04-22
CN102167760A2011-08-31
CN106661151A2017-05-10
CN102870041A2013-01-09
CN1508574A2004-06-30
CN104808441A2015-07-29
US6627385B22003-09-30
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (CN)
Download PDF: