Title:
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, AND METHOD FOR FORMATION OF PATTERN
Document Type and Number:
WIPO Patent Application WO/2008/023712
Kind Code:
A1
Abstract:
Disclosed is a photosensitive resin composition which can form a highly precise
pattern, has excellent thermal degradability of an organic component, and shows
less shrinking after firing. The composition comprises an alkali-soluble
resin (A) having at least one SH group, a polyfunctional (meth)acrylate (B),
a photopolymerization initiator (C) and an inorganic particle (D). Also disclosed
is a method for forming a pattern by using the composition.
Inventors:
KUDOU, Kazunari (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 45, 1040045, JP)
工藤 和生 (〒45 東京都中央区築地五丁目６番１０号 ＪＳＲ株式会社内 Tokyo, 1040045, JP)
YOSHIDA, Takeshi (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 45, 1040045, JP)
吉田 武司 (〒45 東京都中央区築地五丁目６番１０号 ＪＳＲ株式会社内 Tokyo, 1040045, JP)
工藤 和生 (〒45 東京都中央区築地五丁目６番１０号 ＪＳＲ株式会社内 Tokyo, 1040045, JP)
YOSHIDA, Takeshi (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 45, 1040045, JP)
吉田 武司 (〒45 東京都中央区築地五丁目６番１０号 ＪＳＲ株式会社内 Tokyo, 1040045, JP)
Application Number:
JP2007/066213
Publication Date:
February 28, 2008
Filing Date:
August 21, 2007
Export Citation:
Assignee:
JSR CORPORATION (6-10, Tsukiji 5-chome Chuo-k, Tokyo 45, 1040045, JP)
ＪＳＲ株式会社 (〒45 東京都中央区築地五丁目６番１０号 Tokyo, 1040045, JP)
KUDOU, Kazunari (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 45, 1040045, JP)
工藤 和生 (〒45 東京都中央区築地五丁目６番１０号 ＪＳＲ株式会社内 Tokyo, 1040045, JP)
YOSHIDA, Takeshi (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 45, 1040045, JP)
ＪＳＲ株式会社 (〒45 東京都中央区築地五丁目６番１０号 Tokyo, 1040045, JP)
KUDOU, Kazunari (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 45, 1040045, JP)
工藤 和生 (〒45 東京都中央区築地五丁目６番１０号 ＪＳＲ株式会社内 Tokyo, 1040045, JP)
YOSHIDA, Takeshi (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 45, 1040045, JP)
International Classes:
G03F7/033; G02B5/20; G03F7/004; G03F7/027; G03F7/40; H01J9/02; H01J9/227; H01J17/49
Attorney, Agent or Firm:
SUZUKI, Shunichiro (S.SUZUKI & ASSOCIATES, Gotanda Yamazaki Bldg. 6F13-6, Nishigotanda 7-chome,Shinagawa-k, Tokyo 31, 1410031, JP)