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Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION FOR FORMATION OF MICROLENSES
Document Type and Number:
WIPO Patent Application WO/2012/105288
Kind Code:
A1
Abstract:
[Problem] To provide a photosensitive resin composition for the formation of microlenses. [Solution] A photosensitive resin composition for the formation of microlenses, comprising: (A) a copolymer which comprises maleimide structural units represented by formula (1), vinyl ether structural units represented by formula (2), and at least one kind of structural units represented by formula (3), (4) or (5); (B) a photosensitizer; and (C) a crosslinking agent. In the formulae, X is a C1-20 hydrocarbon group which may have either an ether bond or a cyclic structure; Y is an optionally substituted organic group; and Z is an optionally substituted aromatic hydrocarbon group or an alkoxy group.

Inventors:
SAKAGUCHI, Takahiro (Electronic Materials Research Laboratories, 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
Application Number:
JP2012/050479
Publication Date:
August 09, 2012
Filing Date:
January 12, 2012
Export Citation:
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Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD. (7-1 Kanda-Nishiki-cho 3-chome, Chiyoda-ku Tokyo, 54, 〒1010054, JP)
日産化学工業株式会社 (〒54 東京都千代田区神田錦町三丁目7番地1 Tokyo, 〒1010054, JP)
International Classes:
G02B1/04; C08F212/02; C08F216/14; C08F222/40; C08F232/08; G02B3/00; G03F7/033
Domestic Patent References:
WO2008143095A1
WO2009084382A1
WO2010007915A1
WO2011024545A1
Foreign References:
JP2009157038A
JP2009179770A
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (Shin-Ochanomizu Urban Trinity 2, Kandasurugadai 3-chome, Chiyoda-k, Tokyo 62, 〒1010062, JP)
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Claims: