Title:
PHOTOSENSITIVE RESIN COMPOSITION HAVING IMPROVED ADHESIVENESS OR ADHESION AND LIGHT BLOCKING LAYER USING SAME
Document Type and Number:
WIPO Patent Application WO/2019/078566
Kind Code:
A1
Abstract:
A photosensitive resin composition comprising (A) a cardo-based resin comprising a repeating unit represented by chemical formula 1 (comprising chemical formula 4); (B) a reactive unsaturated compound; (C) a pigment; (D) an initiator; and (E) a solvent, and a light blocking layer using the same having improved adhesiveness or adhesion are provided.
Inventors:
LEE MYUNG JUN (KR)
BAE JUN (KR)
MUN SOUNG YUN (KR)
BAE JUN (KR)
MUN SOUNG YUN (KR)
Application Number:
PCT/KR2018/012140
Publication Date:
April 25, 2019
Filing Date:
October 15, 2018
Export Citation:
Assignee:
DUK SAN NEOLUX CO LTD (KR)
International Classes:
G03F7/004; G03F7/027; G03F7/028
Foreign References:
| KR20090056014A | 2009-06-03 | |||
| KR20040087918A | 2004-10-15 | |||
| KR20160115149A | 2016-10-06 | |||
| KR20120105570A | 2012-09-26 | |||
| KR20140146940A | 2014-12-29 | |||
| KR20110008286A | 2011-01-26 |
Attorney, Agent or Firm:
YUIL HIGHEST INTERNATIONAL PATENT AND LAW FIRM (KR)
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