Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR CONTROL OF REFRACTIVE INDEX, AND OPTICAL WAVEGUIDE AND OPTICAL COMPONENT USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2008/029816
Kind Code:
A1
Abstract:
Disclosed are: a resin composition for the formation of an optical waveguide, which shows low propagation loss and high heat stability and enables to form a waveguide pattern at high shape accuracy and at low cost; an optical waveguide; a method for forming an optical waveguide; and an optical element using the method. A photosensitive resin composition is used, which is characterized by comprising (A) a polyamic acid represented by the general formula (I) or a polyamic acid ester, (B) a compound having an epoxy group, and (C) a compound which can generate an acid upon being exposed to light.

Inventors:
CHEN, Ning-Juan (2-12-1 Ookayama, Meguro-k, Tokyo 50, 1528550, JP)
陳寧娟 (〒50 東京都目黒区大岡山2-12-1国立大学法人東京工業大学内 Tokyo, 1528550, JP)
ANDOH, Shinji (2-12-1 Ookayama, Meguro-k, Tokyo 50, 1528550, JP)
安藤慎治 (〒50 東京都目黒区大岡山2-12-1国立大学法人東京工業大学内 Tokyo, 1528550, JP)
Application Number:
JP2007/067241
Publication Date:
March 13, 2008
Filing Date:
August 29, 2007
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NEC Corporation (7-1 Shiba 5-chome, Minato-ku Tokyo, 01, 1088001, JP)
日本電気株式会社 (〒01 東京都港区芝五丁目7番1号 Tokyo, 1088001, JP)
Tokyo Institute of Technology (2-12-1, Ookayama Meguro-k, Tokyo 50, 1528550, JP)
国立大学法人東京工業大学 (〒50 東京都目黒区大岡山2-12-1 Tokyo, 1528550, JP)
CHEN, Ning-Juan (2-12-1 Ookayama, Meguro-k, Tokyo 50, 1528550, JP)
陳寧娟 (〒50 東京都目黒区大岡山2-12-1国立大学法人東京工業大学内 Tokyo, 1528550, JP)
International Classes:
G03F7/004; G02B6/12; G02B6/13; G03F7/038
Attorney, Agent or Firm:
IKEDA, Noriyasu et al. (The 3rd Mori Building, 4-10 Nishishinbashi 1-chom, Minato-ku Tokyo 03, 1050003, JP)
Download PDF: