Title:
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2019/026547
Kind Code:
A1
Abstract:
A photosensitive resin composition containing: a copolymer (A) containing a structure unit (a) having a blocked isocyanate group and a structure unit (b) having an acid radical; a hydroxyl-group-containing organic solvent (B); a reactive diluent (C); and a photopolymerization initiator (D).
Inventors:
NAGAI ERI (JP)
KINOSHITA TAKEHIRO (JP)
KAWAGUCHI YASUAKI (JP)
YANAGI MASAYOSHI (JP)
KURAMOTO HIROKI (JP)
KINOSHITA TAKEHIRO (JP)
KAWAGUCHI YASUAKI (JP)
YANAGI MASAYOSHI (JP)
KURAMOTO HIROKI (JP)
Application Number:
PCT/JP2018/025726
Publication Date:
February 07, 2019
Filing Date:
July 06, 2018
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
International Classes:
G03F7/033; C08F2/44; C08F220/06; C08F220/10; C08F220/36; G02B5/20; G03F7/004; G03F7/20; G03F7/40
Domestic Patent References:
| WO2014141731A1 | 2014-09-18 |
Foreign References:
| JP2016084464A | 2016-05-19 | |||
| JP2011081117A | 2011-04-21 | |||
| JP2011070156A | 2011-04-07 | |||
| JP2010197567A | 2010-09-09 |
Attorney, Agent or Firm:
SOGA, MICHIHARU et al. (JP)
Download PDF:
Previous Patent: COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER
Next Patent: DEVICE FOR PREVENTING AQUATIC ORGANISMS FROM JUMPING OUT
Next Patent: DEVICE FOR PREVENTING AQUATIC ORGANISMS FROM JUMPING OUT