PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING STRUCTURE, AND LIQUID DISCHARGE HEAD

Title:

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING STRUCTURE, AND LIQUID DISCHARGE HEAD

Document Type and Number:

WIPO Patent Application WO/2011/096195

Kind Code:

A1

Abstract:

A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,.

Inventors:

TAKAHASHI, Hyo (C/O CANON KABUSHIKI KAISHA, 30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 14685, JP)
IKEGAME, Ken (C/O CANON KABUSHIKI KAISHA, 30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 14685, JP)
SHIMOMURA, Masako (C/O CANON KABUSHIKI KAISHA, 30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 14685, JP)

Application Number:

JP2011/000549

Publication Date:

August 11, 2011

Filing Date:

February 01, 2011

Export Citation:

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Assignee:

CANON KABUSHIKI KAISHA (30-2, Shimomaruko 3-chome Ohta-k, Tokyo 01, 14685, JP)
TAKAHASHI, Hyo (C/O CANON KABUSHIKI KAISHA, 30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 14685, JP)
IKEGAME, Ken (C/O CANON KABUSHIKI KAISHA, 30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 14685, JP)
SHIMOMURA, Masako (C/O CANON KABUSHIKI KAISHA, 30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 14685, JP)

International Classes:

G03F7/004; B05C5/00; B41J2/05; C09K3/00

Attorney, Agent or Firm:

ABE, Takuma et al. (C/O CANON KABUSHIKI KAISHA, 30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 14685, JP)

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