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Title:
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING STRUCTURE, AND LIQUID DISCHARGE HEAD
Document Type and Number:
WIPO Patent Application WO/2011/096195
Kind Code:
A1
Abstract:
A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,.

Inventors:
TAKAHASHI HYO (JP)
IKEGAME KEN (JP)
SHIMOMURA MASAKO (JP)
Application Number:
PCT/JP2011/000549
Publication Date:
August 11, 2011
Filing Date:
February 01, 2011
Export Citation:
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Assignee:
CANON KK (JP)
TAKAHASHI HYO (JP)
IKEGAME KEN (JP)
SHIMOMURA MASAKO (JP)
International Classes:
G03F7/004; B05C5/00; B41J2/05; C09K3/00
Domestic Patent References:
WO2010143560A12010-12-16
Foreign References:
JP2009269849A2009-11-19
JP2006241384A2006-09-14
JP2005187799A2005-07-14
JPH10212286A1998-08-11
JPH107680A1998-01-13
JPH08157510A1996-06-18
JPS5156885A1976-05-18
JP2008173971A2008-07-31
JP2008256980A2008-10-23
US6155673A2000-12-05
JPH0912615A1997-01-14
JP2009269849A2009-11-19
JPH10212286A1998-08-11
JPH107680A1998-01-13
JPH08157510A1996-06-18
JPH10152554A1998-06-09
JP2005187799A2005-07-14
JP2000321416A2000-11-24
EP2441778A12012-04-18
JP2006241384A2006-09-14
JPS5156885A1976-05-18
JP2008173971A2008-07-31
Other References:
See also references of EP 2531890A4
Attorney, Agent or Firm:
ABE, Takuma et al. (30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, JP)
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Claims:



 
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