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Title:
PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/046296
Kind Code:
A1
Abstract:
Provided are: a photosensitive resin composition which provides excellent adhesion between a photosensitive resin composition layer and an underlying substrate in a developing step, and which has a high taper angle without heat-fusion of the photosensitive resin composition layer during a bake step; a method of producing a cured film; the cured film; a liquid crystal display device; and an organic EL display device. This photosensitive resin composition contains: (A-1) a polymer component that includes polymers satisfying (1) and/or (2), where (1) indicates polymers that have (a1) a structural unit comprising a group comprising an acid radical protected by an acid-decomposable group and (a2) a structural unit comprising a crosslinkable group, and (2) indicates polymers that have (a1) a structural unit comprising a group comprising an acid radical protected by an acid-decomposable group and polymers that have (a2) a structural unit comprising a crosslinkable group; (S) a compound represented by general formula (1) and/or general formula (2); (B-1) a photo-acid-generating agent; and (C-1) a solvent.

Inventors:
FUJIKI YUZO (JP)
YONEZAWA HIROYUKI (JP)
Application Number:
PCT/JP2014/075367
Publication Date:
April 02, 2015
Filing Date:
September 25, 2014
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/075; C08F212/14; C08F220/26; G03F7/023; G03F7/032; G03F7/039
Foreign References:
JPH0572723A1993-03-26
JP2011128359A2011-06-30
JP2010102086A2010-05-06
JP2013156416A2013-08-15
Other References:
LEX, ALEXANDER ET AL.: "Synthesis of a Photosensitive Thiocyanate-Functionalized Trialkoxysilane and Its Appliaction in Patterned Surface Modifications", CHEMISTRY OF MATERIALS, vol. 20, 19 February 2008 (2008-02-19)
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
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