Title:
PHOTOSENSITIVE RESIN COMPOSITION FOR OPTICAL WAVEGUIDE FORMATION AND OPTICAL WAVEGUIDE
Document Type and Number:
WIPO Patent Application WO/2004/031251
Kind Code:
A1
Abstract:
A photosensitive resin composition for optical waveguide formation which comprises the following ingredients (A), (B), and (C) as components. This composition is excellent in suitability for patterning, refractive index, heat resistance, transmission characteristic, etc. (A) A di(meth)acrylate having a structure represented by the following general formula (1): (1) (wherein R1 represents -(OCH2CH2)m-, etc.; X represents -C(CH3)2-, etc.; Y represents hydrogen or halogeno; and m is an integer of 0 to 4); (B) a mono(meth)acrylate having a structure represented by the following general formula (2): (2) (wherein R2 represents -(OCH2CH2)p-, etc.; Y represents hydrogen, halogeno, Ph, etc.; and p is an integer of 0 to 4; provided that Ph represents phenyl); and (C) a free-radical photopolymerization initiator.
Inventors:
TAKASE HIDEAKI (JP)
ERIYAMA YUUICHI (JP)
ERIYAMA YUUICHI (JP)
Application Number:
PCT/JP2003/012479
Publication Date:
April 15, 2004
Filing Date:
September 30, 2003
Export Citation:
Assignee:
JSR CORP (JP)
TAKASE HIDEAKI (JP)
ERIYAMA YUUICHI (JP)
TAKASE HIDEAKI (JP)
ERIYAMA YUUICHI (JP)
International Classes:
C08F220/10; C08F222/10; G02B6/12; G02B6/122; G02B6/13; G02B6/138; (IPC1-7): C08F220/10; G02B6/12
Foreign References:
| JPH01299807A | 1989-12-04 | |||
| JPH0331309A | 1991-02-12 | |||
| JPS60202110A | 1985-10-12 | |||
| JP2000066051A | 2000-03-03 | |||
| JPH05119203A | 1993-05-18 |
Other References:
See also references of EP 1553114A4
Attorney, Agent or Firm:
Hirata, Naoyuki (Takou Building Kudan 4F 8-5, Iidabashi 2-chom, Chiyoda-ku Tokyo, JP)
Download PDF: