Title:
PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN PLATE PRECURSOR
Document Type and Number:
WIPO Patent Application WO/2018/088336
Kind Code:
A1
Abstract:
The present invention provides a photosensitive resin composition that contains a resin (A) having an ionic functional group, a photopolymerization initiator (B), a photopolymerizable monomer (C), and a fluorine-containing compound (D) having an ionic functional group capable of forming counterions with the resin (A). By virtue of the present invention, it is possible to economically provide a photosensitive resin letterpress plate capable of maintaining the antifouling plate surface even during a printing step and a post-printing plate washing step without adding operations to the conventional plate making step, thereby providing a plate capable of significantly reducing printing defects caused by halftone mottle.
Inventors:
IDO KENJI (JP)
NORO YOHEI (JP)
TAKAHASHI RYOSUKE (JP)
NORO YOHEI (JP)
TAKAHASHI RYOSUKE (JP)
Application Number:
PCT/JP2017/039802
Publication Date:
May 17, 2018
Filing Date:
November 02, 2017
Export Citation:
Assignee:
TORAY INDUSTRIES (JP)
International Classes:
G03F7/004; G03F7/00; G03F7/033
Foreign References:
| JP2009139763A | 2009-06-25 | |||
| JP2009078468A | 2009-04-16 | |||
| JPS61264339A | 1986-11-22 | |||
| JP2011197103A | 2011-10-06 | |||
| JPH0720630A | 1995-01-24 | |||
| JPS5036204A | 1975-04-05 |
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