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Title:
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN VARNISH, PHOTOSENSITIVE RESIN FILM, AND PHOTOSENSITIVE RESIN CURED PRODUCT
Document Type and Number:
WIPO Patent Application WO/2011/065546
Kind Code:
A1
Abstract:
Provided are: a photosensitive resin composition from which it is possible to obtain a photocured product which can be cured rapidly by exposure to light, is transparent with respect to visible light in the range of 400-780nm, and exhibits excellent reliability in heat resistance. Also provided are a photosensitive resin varnish, a photosensitive resin film, and a photosensitive resin cured product. The photosensitive resin composition comprises (A) a polymerizable compound, (B) a polymerization initiator, and (C) a hindered phenolic antioxidant. Component (B) includes (B-1) at least one substance selected from an α-hydroxyacetophenone-based photoinitiator and a glyoxy ester-based photoinitiator, and (B-2) a phosphine oxide-based photoinitiator. Component (C) is a hindered phenolic antioxidant in which each molecule comprises at least one phenol group that has one methyl group and one t-butyl group on the same aromatic ring. The content of component (B) is 0.02 to 4.0 parts by mass per 100 parts by mass of component (A), and the content of component (C) is 0.01 to 1 parts by mass per 100 parts by mass of component (A).

Inventors:
SUZUMURA, Kouji (14, Goiminamikaigan, Ichihara-sh, Chiba 67, 〒2908567, JP)
鈴村 浩二 (〒67 千葉県市原市五井南海岸14番地 日立化成工業株式会社内 Chiba, 〒2908567, JP)
MITANI, Ikue (48, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
三谷 育恵 (〒47 茨城県つくば市和台48 日立化成工業株式会社内 Ibaraki, 〒3004247, JP)
TAKASAKI, Toshihiko (48, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
Application Number:
JP2010/071295
Publication Date:
June 03, 2011
Filing Date:
November 29, 2010
Export Citation:
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Assignee:
HITACHI CHEMICAL COMPANY, LTD. (1-1 Nishi-Shinjuku 2-chome, Shinjuku-ku Tokyo, 49, 〒1630449, JP)
日立化成工業株式会社 (〒49 東京都新宿区西新宿二丁目1番1号 Tokyo, 〒1630449, JP)
SUZUMURA, Kouji (14, Goiminamikaigan, Ichihara-sh, Chiba 67, 〒2908567, JP)
鈴村 浩二 (〒67 千葉県市原市五井南海岸14番地 日立化成工業株式会社内 Chiba, 〒2908567, JP)
MITANI, Ikue (48, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
三谷 育恵 (〒47 茨城県つくば市和台48 日立化成工業株式会社内 Ibaraki, 〒3004247, JP)
International Classes:
C08F290/00; C08F2/50; C08F20/20; C09D4/00; C09D7/12
Attorney, Agent or Firm:
OHTANI, Tamotsu et al. (OHTANI PATENT OFFICE, Bridgestone Toranomon Bldg. 6F. 25-2, Toranomon 3-chome, Minato-k, Tokyo 01, 〒1050001, JP)
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