PHOTOSENSITIVE RESIN COMPOSITION

WIPO Patent Application WO/2011/052925

A3

The present invention relates to a photosensitive resin composition. More specifically, the present invention relates to a positive photosensitive resin composition for the formation of an organic interlayer dielectric layer, wherein the photosensitive resin composition comprises one or more kinds of compounds selected from the group consisting of a) a UV stabilizer, b) a radical scavenger, and c) an antioxidant. The photosensitive resin composition of the present invention is used as an organic interlayer dielectric layer of TFT-LCDs to be able to improve problems of the leaning phenomenon of liquid crystals in case of overexposure in a process for photoalignment of liquid crystals and to easily control resolution of patterns, and is particularly suitable for the formation of a flattened organic interlayer dielectric layer.

YUN JOO-PYO (KR)
KIM BYUNG-UK (KR)
YOUN HYOC-MIN (KR)
KOO KI-HYUK (KR)
YEO TAE-HOON (KR)
SHIN HONG-DAE (KR)
LEE SANG-HOON (KR)
KIM DONG-MYUNG (KR)
CHOI SU-YOUN (KR)
KIM JIN-SUN (KR)
WOO CHANG-MIN (KR)
KIM HONG-SUK (KR)

PCT/KR2010/007220

October 20, 2011

October 21, 2010

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DONGJIN SEMICHEM CO LTD (KR)
YUN JOO-PYO (KR)
KIM BYUNG-UK (KR)
YOUN HYOC-MIN (KR)
KOO KI-HYUK (KR)
YEO TAE-HOON (KR)
SHIN HONG-DAE (KR)
LEE SANG-HOON (KR)
KIM DONG-MYUNG (KR)
CHOI SU-YOUN (KR)
KIM JIN-SUN (KR)
WOO CHANG-MIN (KR)
KIM HONG-SUK (KR)

G03F7/039; G02F1/13; G03F7/022

WO2003010602A1

2003-02-06

KR20100099059A	2010-09-10
US5314783A	1994-05-24
US20090233231A1	2009-09-17

WON, Young-ho (642-6 Yeoksam-Dong, Gangnam-Ku, Seoul 135-717, KR)

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