PHOTOSENSITIVE RESIN COMPOSITION

WIPO Patent Application WO/2018/194170

A1

[Problem] To provide a photosensitive resin composition which is used for a liquid crystal display device, an organic EL display device, and the like, can retain a good image even after being cured, has high water repellency and high oil repellency on the surface of a cured film even when not subjected to a treatment such as plasma treatment or UV ozone treatment, has little residue, and is capable of forming an image of a cured film having high lyophilicity and high lipophilicity on a substrate. [Solution] The present invention provides a thermosettable photosensitive resin composition containing the following components (A), (B), (C), and (D), where component (A) is a polymer having (A1) a liquid-repellent group and (A2) a trialkoxysilyl group, component (B) is an alkali-soluble resin, component (C) is a solvent, and component (D) is a photosensitizer.

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HOSHINO YUKI (JP)
YUKAWA SHOJIRO (JP)
OMURA HIROYUKI (JP)
HATANAKA TADASHI (JP)

PCT/JP2018/016357

October 25, 2018

April 20, 2018

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NISSAN CHEMICAL CORP (JP)

G03F7/004; C08F2/50; C08F220/24; C08F220/28; C08F220/30; C08F230/08; G02F1/1333; G03F7/023; G03F7/027; H01L27/32; H01L51/50; H05B33/12; H05B33/22

WO2012074076A1	2012-06-07
WO2013133392A1	2013-09-12

JP2008249867A	2008-10-16
JP2016133586A	2016-07-25
US20150031808A1	2015-01-29

HANABUSA PATENT & TRADEMARK OFFICE (JP)

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