Title:
PHOTOSENSITIVE SILOXANE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2012/157696
Kind Code:
A1
Abstract:
[Problem] To provide a photosensitive siloxane resin composition having excellent alkali solubility and photosensitivity, and a pattern formation method using the same. [Solution] Provided is a photosensitive siloxane resin composition that contains the following: a siloxane resin having a silanol group or alkoxysilyl group; a crown ether; a photosensitizing agent; and an organic solvent. A pattern is formed by coating this photosensitive composition on a substrate, subjecting the composition to image-wise exposure, treating the same with an aqueous alkaline solution and then firing.
Inventors:
SEKITO TAKASHI (JP)
YOKOYAMA DAISHI (JP)
FUKE TAKASHI (JP)
TASHIRO YUJI (JP)
NONAKA TOSHIAKI (JP)
TANAKA YASUAKI (JP)
YOKOYAMA DAISHI (JP)
FUKE TAKASHI (JP)
TASHIRO YUJI (JP)
NONAKA TOSHIAKI (JP)
TANAKA YASUAKI (JP)
Application Number:
PCT/JP2012/062611
Publication Date:
November 22, 2012
Filing Date:
May 17, 2012
Export Citation:
Assignee:
AZ ELECTRONIC MATERIALS IP JAPAN K K (JP)
SEKITO TAKASHI (JP)
YOKOYAMA DAISHI (JP)
FUKE TAKASHI (JP)
TASHIRO YUJI (JP)
NONAKA TOSHIAKI (JP)
TANAKA YASUAKI (JP)
SEKITO TAKASHI (JP)
YOKOYAMA DAISHI (JP)
FUKE TAKASHI (JP)
TASHIRO YUJI (JP)
NONAKA TOSHIAKI (JP)
TANAKA YASUAKI (JP)
International Classes:
G03F7/004; G03F7/023; G03F7/075; H01L21/027
Foreign References:
| JPH08190193A | 1996-07-23 | |||
| JP2000191656A | 2000-07-11 | |||
| JPH03166229A | 1991-07-18 |
Attorney, Agent or Firm:
KATSUNUMA Hirohito et al. (JP)
Katsunuma Hirohito (JP)
Katsunuma Hirohito (JP)
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Claims: