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Patent Searching and Data


Title:
PHOTOSENSITIVE STRUCTURE FOR FLEXOGRAPHIC PRINTING
Document Type and Number:
WIPO Patent Application WO/2004/104701
Kind Code:
A1
Abstract:
A photosensitive structure for flexographic printing having a support (A) and, laminated thereon, an adhesive layer (B) and a photosensitive resin layer (C) different from said adhesive layer (B), wherein said adhesive layer (B) is an adhesive layer (B) comprising a thermoplastic elastomer (a) derived from at least one monovinyl substituted aromatic hydrocarbon and a conjugated diene, at least one ethylenically unsaturated compound (b) and at least one polymerization initiator (c), wherein said ethylenically unsaturated compound (b) comprises at least one (meth)acrylate (i) having one or more aromatic rings and/or one or more hydroxyl groups in the molecule thereof.

Inventors:
MATSUMOTO MASAKI (JP)
YAMADA HIROSHI (JP)
Application Number:
PCT/JP2004/006245
Publication Date:
December 02, 2004
Filing Date:
May 10, 2004
Export Citation:
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Assignee:
ASAHI KASEI CHEMICALS CORP (JP)
MATSUMOTO MASAKI (JP)
YAMADA HIROSHI (JP)
International Classes:
B41N1/12; G03F7/095; G03F7/11; G03F7/027; (IPC1-7): G03F7/00; B41N1/12; G03F7/11
Foreign References:
JPH08297369A1996-11-12
JP2000258898A2000-09-22
JPH028851A1990-01-12
JPH06214378A1994-08-05
JPH08297369A1996-11-12
EP0055807A21982-07-14
US4320188A1982-03-16
EP0059385A21982-09-08
Other References:
See also references of EP 1628158A4
"Encyclopedic Dictionary of Chemistry", 1989, TOKYO KAGAKU DOJIN CO., LTD.
Attorney, Agent or Firm:
Asamura, Kiyoshi (New Ohtemachi Bldg. 2-1, Ohtemachi 2-chome, Chiyoda-k, Tokyo 04, JP)
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