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Title:
PHOTOSENSITIVE TRANSFER FILM, METHOD FOR PRODUCING ANTISTATIC PATTERN, METHOD FOR PRODUCING PHOTOSENSITIVE TRANSFER FILM, LAMINATE, TOUCH PANEL, METHOD FOR PRODUCING TOUCH PANEL, AND DISPLAY DEVICE WITH TOUCH PANEL
Document Type and Number:
WIPO Patent Application WO/2020/196345
Kind Code:
A1
Abstract:
Provided are a photosensitive transfer film and applications of the photosensitive transfer film, the photo sensitive transfer film having a photosensitive layer with a thickness of 10 μm or less and an antistatic layer in this order, the photosensitive layer including an alkali-soluble acrylic resin, a radically polymerizable compound having an ethylenically unsaturated group, and a photopolymerization initiator.

Inventors:
SHIMOYAMA TATSUYA (JP)
UEKI KEIGO (JP)
Application Number:
PCT/JP2020/012526
Publication Date:
October 01, 2020
Filing Date:
March 19, 2020
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
B32B27/00; B32B7/025; B32B7/06; B32B27/18; B32B27/30; C08F2/44; C08F290/12; G03F7/004; G03F7/033; G03F7/038; G03F7/09; G03F7/095; G03F7/11; G03F7/20; G06F3/041; G06F3/044; H01L27/32; H01L51/50; H05B33/02; H05B33/10
Domestic Patent References:
WO2018061506A12018-04-05
Foreign References:
JP2017201354A2017-11-09
JP2003107674A2003-04-09
JP2006048024A2006-02-16
JP2017181673A2017-10-05
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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