Title:
PHOTOSENSITIVE TRANSFER MATERIAL, METHOD FOR PRODUCING RESIST PATTERN, METHOD FOR PRODUCING CIRCUIT WIRING LINE, TOUCH PANEL, AND TOUCH PANEL DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/187364
Kind Code:
A1
Abstract:
A photosensitive transfer material which sequentially comprises a temporary support body, an intermediate layer and a positive photosensitive resin layer in this order, and which is configured such that the temporary support body and the intermediate layer are in contact with each other and the surface of the intermediate layer, said surface being in contact with the temporary support body, has an indentation hardness of 5.0 mN or more; a method for producing a resist pattern, which uses the photosensitive transfer material; a method for producing a circuit wiring line; a touch panel; and a touch panel display device.
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Inventors:
KATAYAMA AKIO (JP)
KANNA SHINICHI (JP)
KANNA SHINICHI (JP)
Application Number:
PCT/JP2018/044987
Publication Date:
October 03, 2019
Filing Date:
December 06, 2018
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/11; C08F20/28; C08G8/36; G03F7/004; G03F7/039; G03F7/20; H05K3/06
Foreign References:
| JP2007140450A | 2007-06-07 | |||
| JP2010060841A | 2010-03-18 | |||
| JP2012027357A | 2012-02-09 | |||
| JP2007264483A | 2007-10-11 | |||
| JP2008175957A | 2008-07-31 | |||
| JPS63197942A | 1988-08-16 | |||
| JP2018031847A | 2018-03-01 | |||
| JP2017120435A | 2017-07-06 | |||
| US20110008733A1 | 2011-01-13 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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