PHOTOSENSOR SUBSTRATE

WIPO Patent Application WO/2016/195000

A1

To decrease the resistance of a wiring line of a photosensor substrate. This photosensor substrate is provided with: a substrate 31; a plurality of gate lines that are arranged on the substrate 31 and extend in a first direction; a plurality of source lines Si that are arranged on the substrate 31 and extend in a second direction that is different from the first direction; transistors that are arranged so as to correspond to the intersection points of the source lines Si and the gate lines and are connected to the source lines Si and the gate lines; an insulating layer that covers the transistors; photoelectric conversion elements 4 that are arranged so as to correspond to the intersection points of the source lines Si and the gate lines and are connected to the transistors via first contact holes CH3 of the insulating layer; and a plurality of bias lines 8 that extend in the second direction and are connected to the photoelectric conversion elements 4. The source lines Si are connected to the transistors via second contact holes CH2 of the insulating layer, and the line width of the source lines Si is wider than the line width of the bias lines 8.

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NAKANO FUMIKI
MIYAMOTO TADAYOSHI

PCT/JP2016/066361

December 08, 2016

June 02, 2016

Click for automatic bibliography generation  

SHARP KK (JP)

H01L27/146; H01L29/786; H04N5/374

JP2014078651A	2014-05-01
JP2010075605A	2010-04-08
JPH06324350A	1994-11-25
JP2010003766A	2010-01-07
JP2009043826A	2009-02-26
JP2012038857A	2012-02-23
JP2012079820A	2012-04-19
JP2013135060A	2013-07-08
US7902512B1	2011-03-08

KAWAKAMI Keiko et al. (JP)
Keiko Kawakami (JP)

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