PHOTOVOLTAIC ELEMENT AND MANUFACTURING METHOD THEREFOR

WIPO Patent Application WO/2014/148443

A1

Provided are a photovoltaic element and a manufacturing method therefor wherein, without using any organic solvents that are harmful to humans, pyramid-shaped irregularities are etched into a silicon substrate so as to increase the generating efficiency of said photovoltaic element. Said photovoltaic element (10) is provided with the following: a silicon substrate (11), the surface of which has a large number of pyramid-shaped irregularities formed thereon via anisotropic etching; and amorphous silicon thin films (12 through 15) formed on top of the pyramid-shaped irregularities via chemical vapor deposition. The etching conditions are selected such that the mean length of the diagonals of the pyramids that form the pyramid-shaped irregularities, as defined by the following equation, is less than 5 µm. Mean length of diagonals = (2 × surface area in field of view / number of pyramid apexes in field of view)0.5

KOBAYASHI EIJI (JP)

PCT/JP2014/057189

September 25, 2014

March 17, 2014

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CHOSHU INDUSTRY CO LTD (JP)

H01L31/0236; H01L31/0747; H01L31/18

WO1998043304A1	1998-10-01
WO1998043304A1	1998-10-01

US20110174371A1	2011-07-21
JP2007294830A	2007-11-08
JP2012064839A	2012-03-29
JPH07142753A	1995-06-02
JP2009164625A	2009-07-23
JP2011515872A	2011-05-19
JP2010074102A	2010-04-02
JP2010074102A	2010-04-02
JP2009206335A	2009-09-10
JP2012227304A	2012-11-15
JP2005536894A	2005-12-02

SARA OLIBET ET AL., PHYS. STATUS SOLIDI A, 2010, pages 1 - 6
See also references of EP 2978026A4

NAKAMAE Fujio et al. (JP)
Fujio Nakamae (JP)

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