Title:
PHOTOVOLTAIC SILICON WAFER CLEANING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/206041
Kind Code:
A1
Abstract:
Provided is a photovoltaic silicon wafer cleaning apparatus, comprising a seal mechanism (1), a fixing mechanism (2), a front-end limiting mechanism (3), and a rear-end limiting mechanism (4). The fixing mechanism (2) is provided inside the seal mechanism (1). The front end of the fixing mechanism (2) is connected to the seal mechanism (1) by means of the front-end limiting mechanism (3), and the rear end of the fixing mechanism (2) is connected to the seal mechanism (1) by means of the rear-end limiting mechanism (4). The front-end limiting mechanism (3) and the rear-end limiting mechanism (4) can provide effective support and limitation when the fixing mechanism (2) is placed on the inner side of the sealing mechanism (1), thereby ensuring the stability of the entire fixing mechanism (2) during placement and use; and forward and backward translation of a water supply base (43) can implement a quick connection to connectors, thereby improving cleaning work efficiency.
Inventors:
QIAN CHENG (CN)
LI GANG (CN)
LI GANG (CN)
Application Number:
PCT/CN2021/139132
Publication Date:
October 06, 2022
Filing Date:
December 17, 2021
Export Citation:
Assignee:
JIANGSU ASIA ELECTRONICS TECH CO LTD (CN)
International Classes:
B08B3/02; B08B13/00; H01L21/67; H02S40/10
Foreign References:
| CN215613508U | 2022-01-25 | |||
| CN113182244A | 2021-07-30 | |||
| CN113182243A | 2021-07-30 | |||
| CN103799940A | 2014-05-21 | |||
| CN206259324U | 2017-06-16 | |||
| CN103748974A | 2014-04-23 | |||
| CN111463153A | 2020-07-28 | |||
| JPH06151401A | 1994-05-31 | |||
| CN212041662U | 2020-12-01 | |||
| CN110610887A | 2019-12-24 |
Attorney, Agent or Firm:
RUNWEN PATENT LAW FIRM (CN)
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