Title:
PHYSICAL VAPOR DEPOSITION SYSTEM COMPRISING POSITIONING MARKER AND METHOD FOR ADJUSTING DISTANCE BETWEEN CRUCIBLE AND SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/104727
Kind Code:
A1
Abstract:
A physical vapor deposition system (1) comprises a crucible (10) for holding a source material (102), a substrate holder (20) for holding a substrate (4), and a moving device (6a, 6b) for moving the crucible (10) for the substrate holder (20). A method for adjusting distance between the crucible (10) and the substrate (4) in the physical vapor deposition system (1) is also presented.
Inventors:
PENG SHOU (CN)
HARR MICHAEL (DE)
YIN XINJIAN (CN)
FU GANHUA (DE)
SPATH BETTINA (DE)
MISCHKE MARCEL (DE)
SIEPCHEN BASTIAN (DE)
HARR MICHAEL (DE)
YIN XINJIAN (CN)
FU GANHUA (DE)
SPATH BETTINA (DE)
MISCHKE MARCEL (DE)
SIEPCHEN BASTIAN (DE)
Application Number:
PCT/CN2017/114304
Publication Date:
June 06, 2019
Filing Date:
December 01, 2017
Export Citation:
Assignee:
CHINA TRIUMPH INT ENG CO LTD (CN)
CTF SOLAR GMBH (DE)
CTF SOLAR GMBH (DE)
International Classes:
C23C14/24
Foreign References:
| CN105940140A | 2016-09-14 | |||
| CN102234762A | 2011-11-09 | |||
| US20090258134A1 | 2009-10-15 | |||
| US20140044863A1 | 2014-02-13 |
Other References:
See also references of EP 3717675A4
Attorney, Agent or Firm:
J.Z.M.C. PATENT AND TRADEMARK LAW OFFICE (GENERAL PARTNERSHIP) (CN)
Download PDF: