Title:
PIXEL STRUCTURE AND MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/176583
Kind Code:
A1
Abstract:
Disclosed are a pixel structure and a manufacturing method. The manufacturing method comprises: preparing a substrate (11); manufacturing, on the substrate, a black photoresist layer (12) with an accommodation cavity (121) and an isolation area (122); coating a surface, other than the isolation area, of the black photoresist layer with a polyelectrolyte solution, air-drying the surface, and forming a polyelectrolyte layer (13); coating a surface of the polyelectrolyte layer with a metal nano-particle solution, air-drying the surface, and forming a metal particle layer (14); and aligning and transferring a micro light-emitting diode (15) to the black photoresist layer. By means of the method, the light utilization rate of a micro light-emitting diode can be increased.
Inventors:
LI DONGZE (CN)
CHEN LIXUAN (CN)
CHEN LIXUAN (CN)
Application Number:
PCT/CN2017/083689
Publication Date:
October 04, 2018
Filing Date:
May 10, 2017
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
H01L27/15; H01L33/00
Foreign References:
| CN105976725A | 2016-09-28 | |||
| CN101866075A | 2010-10-20 |
Other References:
See also references of EP 3605616A4
Attorney, Agent or Firm:
CHINA WISPRO INTELLECTUAL PROPERTY LLP. (CN)
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