Title:
PLANAR SUBSTRATE TYPE PATCH-CLAMP DEVICE FOR MEASURING ION CHANNEL ACTIVITY, SUBSTRATE FOR FABRICATING PATCH-CLAMP DEVICE AND METHOD OF PRODUCING THE SAME
Document Type and Number:
WIPO Patent Application WO/2007/116978
Kind Code:
A1
Abstract:
A patch-clamp device of the planar substrate type wherein an ultramicropore is
formed through a substantially planar SOI substrate, a cell membrane is located around
the inlet of the ultramicropore, and electrodes are provided across the cell
membrane, the ultramicropore and a conductive liquid so that the current between
the electrodes can be taken out. Use of this device makes it possible to measure
the activity degree of an ion channel protein in the cell membrane at a high responsiveness.
Inventors:
URISU TSUNEO (JP)
Application Number:
PCT/JP2007/057788
Publication Date:
October 18, 2007
Filing Date:
April 06, 2007
Export Citation:
Assignee:
KEK HIGH ENERGY ACCELERATOR (JP)
URISU TSUNEO (JP)
URISU TSUNEO (JP)
International Classes:
G01N27/416; G01N27/07; G01N27/28; G01N27/327; C12M1/00; G01N35/08; G01N37/00
Foreign References:
| JP2005265758A | 2005-09-29 | |||
| JP2003511668A | 2003-03-25 |
Attorney, Agent or Firm:
NAKAJIMA, Jun et al. (NAKAJIMA & KATO Seventh Floor, HK-Shinjuku Bldg., 3-17, Shinjuku 4-chome, Shinjuku-k, Tokyo 22, JP)
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