Title:
PLASMA ADVANCED WATER TREATMENT APPARATUS
Document Type and Number:
WIPO Patent Application WO/2012/128561
Kind Code:
A2
Abstract:
The present invention relates to a plasma advanced water treatment apparatus which removes coliform bacillus or various bacteria using plasma discharge and also removes various non-biodegradable organics through a radical generating source such as ozone. The plasma advanced water treatment apparatus includes: a double pipe having a first passage for water to be treated and a second passage for radical reaction gas, which are separated from each other; a plasma generation unit including electrodes arranged in each of the first and second passages of the double pipe and a power source part connected to the electrodes; and a water tank connected to the double pipe to provide a space in which the water to be treated and the radical generation source react with each other.
Inventors:
LEE MIN KI (KR)
LEE JAE HYEOK (KR)
LEE JAE HYEOK (KR)
Application Number:
PCT/KR2012/002051
Publication Date:
September 27, 2012
Filing Date:
March 22, 2012
Export Citation:
Assignee:
JARWON ELECTRONICS CO LTD (KR)
LEE MIN KI (KR)
LEE JAE HYEOK (KR)
LEE MIN KI (KR)
LEE JAE HYEOK (KR)
International Classes:
C02F1/46; C02F1/78; H05H1/24
Foreign References:
| JP2008178870A | 2008-08-07 | |||
| KR19990009569A | 1999-02-05 | |||
| JP2000117049A | 2000-04-25 | |||
| KR20090097340A | 2009-09-16 | |||
| KR20090110060A | 2009-10-21 |
Attorney, Agent or Firm:
CHEON, Sungmin (KR)
천성민 (KR)
천성민 (KR)
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