PLASMA CHAMBER ARC SUPPRESSION METHOD AND APPARATUS, AND RADIO FREQUENCY POWER SUPPLY SYSTEM

WIPO Patent Application WO/2023/222046

A1

The present application relates to a plasma chamber arc suppression method and apparatus, and a radio frequency power supply system. The method comprises: acquiring reflection coefficients in a plasma chamber by means of arc detection sampling, the reflection coefficients comprising an instantaneous reflection coefficient and an average reflection coefficient; comparing the absolute value of the difference between the instantaneous reflection coefficient and the average reflection coefficient with a set reflection coefficient threshold; if it is determined that an arc is produced in the plasma chamber according to a comparison result, instructing, by means of a state machine, to freeze the last working parameters corresponding to a recovery node of the radio frequency power supply system, to pause arc detection sampling, and to cut off power output of an output end connected to the plasma chamber by means of a control module of a PID controller; and after the electric arc in the plasma chamber disappears, instructing the control module of the PID controller to restore power output of the output end according to working parameters, and restoring electric arc detection sampling. High precision intrachamber arc suppression is implemented.

TANG YAHAI (CN)
LIN WEIQUN (CN)
LE WEIPING (CN)
LIN GUIHAO (CN)

PCT/CN2023/094827

November 23, 2023

May 17, 2023

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SHENZHEN CSL VACUUM SCIENCE AND TECH CO LTD (CN)

H01J37/32

CN115020178A	2022-09-06
CN114446752A	2022-05-06
CN107275179A	2017-10-20
CN112635285A	2021-04-09
JP2007177267A	2007-07-12

SHENZHEN CHENWEI INTELLECTUAL PROPERTY AGENCY OFFICE (GENERAL PARTNERSHIP) (CN)

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