Title:
PLASMA CLEANING METHOD FOR PARALLEL PLATE ELECTRODES
Document Type and Number:
WIPO Patent Application WO/2012/014565
Kind Code:
A1
Abstract:
The disclosed plasma cleaning method for parallel plate electrodes uses a gas containing F2 or CF3OF as a cleaning gas and generates plasma in order to remove Si-containing material, Ge-containing material or metal-containing material accumulated on the surface of plasma-generating parallel plate electrodes located in a reaction chamber of a parallel plate-type plasma CVD device, wherein said accumulations are removed by generating plasma with applied power density between 0.05W/cm2 and 0.5W/cm2 in the presence of said cleaning gas. Using this method, the parallel plate electrodes can be prevented from being damaged.
Inventors:
UMEZAKI, Tomonori (())
梅崎 智典 (())
梅崎 智典 (())
Application Number:
JP2011/062652
Publication Date:
February 02, 2012
Filing Date:
June 02, 2011
Export Citation:
Assignee:
CENTRAL GLASS COMPANY, LIMITED (5253, Oaza Okiube Ube-sh, Yamaguchi 01, 〒7550001, JP)
セントラル硝子株式会社 (〒01 山口県宇部市大字沖宇部５２５３番地 Yamaguchi, 〒7550001, JP)
UMEZAKI, Tomonori (())
セントラル硝子株式会社 (〒01 山口県宇部市大字沖宇部５２５３番地 Yamaguchi, 〒7550001, JP)
UMEZAKI, Tomonori (())
International Classes:
C23C16/44; H01L21/205
Attorney, Agent or Firm:
KOBAYASHI, Hiromichi et al. (Ekisaikai Bldg. 1-29, Akashi-cho, Chuo-k, Tokyo 44, 〒1040044, JP)
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Claims: