PLASMA ETCHING APPARATUS MEMBER HAVING IMPROVED PLASMA-RESISTANT PROPERTIES AND MANUFACTURING METHOD THEREFOR

Title:

PLASMA ETCHING APPARATUS MEMBER HAVING IMPROVED PLASMA-RESISTANT PROPERTIES AND MANUFACTURING METHOD THEREFOR

Document Type and Number:

WIPO Patent Application WO/2019/054617

Kind Code:

A1

Abstract:

The present invention relates to a plasma etching apparatus member and a manufacturing method therefor and, more specifically, to: a plasma etching apparatus member, which improves plasma-resistant properties through deposition of rare earth metal thin film and surface heat treatment, and maintains light transmittance so as to be usable as a member for analyzing the end point of an etching process; and a manufacturing method therefor.

Inventors:

JEONG DONGHUN (KR)
KO HYUNCHUL (KR)
KIM SUNTAE (KR)

Application Number:

PCT/KR2018/008074

Publication Date:

March 21, 2019

Filing Date:

July 17, 2018

Export Citation:

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Assignee:

KOMICO LTD (KR)

International Classes:

H01L21/3065; H01L21/02; H01L21/324

Foreign References:

US20140377504A1	2014-12-25
JP2016188160A	2016-11-04
KR101183021B1	2012-09-14
KR101108692B1	2012-01-25
JP2001240482A	2001-09-04

Attorney, Agent or Firm:

GHONG-GAN INTERNATIONAL PATENT LAW FIRM (KR)

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