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Patent Searching and Data


Title:
PLASMA GAS SCRUBBER DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/134761
Kind Code:
A2
Abstract:
The present invention relates to a plasma gas scrubber device. The plasma gas scrubber device according to the present invention comprises: a plurality of processing chambers where waste gas is treated by means of plasma; a plurality of nozzles which are provided at the rear ends of the processing chambers and spray water onto the waste gas discharged from the processing chambers; a single water tank connected to the plurality of processing chambers and nozzles; and a single condenser which is connected to the water tank, and cools and condenses the water vapour produced from the processing chambers and the nozzles. Because the plasma gas scrubber device according to the present invention has a plurality of processing chambers, optimum waste gas treatment can be effected by appropriately selecting the number of processing chambers in accordance with the volume to be treated.

Inventors:
KIM IK NYEON (KR)
CHANG HONG KI (KR)
JI YOUNG YEON (KR)
Application Number:
KR2010/003179
Publication Date:
November 25, 2010
Filing Date:
May 20, 2010
Export Citation:
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Assignee:
TRIPLECORESKOREA (KR)
KIM IK NYEON (KR)
CHANG HONG KI (KR)
JI YOUNG YEON (KR)
International Classes:
B01D53/32; A61L9/22; B01D47/00; B01D53/26
Foreign References:
KR100710009B12007-04-16
KR100881286B12009-02-03
KR100821263B12008-04-11
US20060272559A12006-12-07
Attorney, Agent or Firm:
KIM, KANG WOOK (KR)
김강욱 (KR)
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Claims: