Title:
PLASMA GENERATING DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/159838
Kind Code:
A1
Abstract:
[Problem] To provide a plasma generating device capable of efficient film formation while avoiding damage to a member to be film-formed due to plasma heat. [Solution] The plasma generating device according to the present invention is characterized in that: a pair of plate-like conductor parts 12, 14 each having a plurality of through-holes 26, 28 passing between main surfaces are opposed to each other with a predetermined gap 13 therebetween; a gas is flowed into the through-holes from one side of the pair of plate-like conductor parts 12, 14; plasma discharge is generated in the gap by applying a high-frequency voltage between the pair of plate-like conductor parts 12 and 14; and the generated plasma is flowed out to the other side of the pair of plate-like conductor parts 12, 14.
Inventors:
TAKAHASHI NAOKI (JP)
UEYAMA HIROYUKI (JP)
NOSE KOICHI (JP)
UEYAMA HIROYUKI (JP)
NOSE KOICHI (JP)
Application Number:
PCT/JP2017/010843
Publication Date:
September 21, 2017
Filing Date:
March 17, 2017
Export Citation:
Assignee:
JCU CORP (JP)
International Classes:
H05H1/46; C23C16/509; C23C16/54; H01J37/32
Foreign References:
JP2002203836A | 2002-07-19 | |||
JP2014510390A | 2014-04-24 | |||
JP2009199952A | 2009-09-03 | |||
JP2015098617A | 2015-05-28 | |||
JP2014042051A | 2014-03-06 | |||
JP2011154973A | 2011-08-11 | |||
JP2004235673A | 2004-08-19 |
Attorney, Agent or Firm:
SATO, Masaru (JP)
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