PLASMA GENERATING EQUIPMENT - NISSIN ELECTRIC CO LTD

Title:

PLASMA GENERATING EQUIPMENT

Document Type and Number:

WIPO Patent Application WO/2005/094140

Kind Code:

A1

Abstract:

Plasma generating equipment is provided with a plasma generating chamber (10) and a high-frequency antenna (1) arranged in the chamber (10), and generates inductively coupled plasma by applying high-frequency power to a gas in the chamber (10) from the antenna (1). The antenna (1) is a low-inductance antenna composed of a first part (11) extending from the outside of the chamber (10) to the inside of the chamber (10), and a plurality of second parts (12), which are branched electrically parallel from a chamber inner side edge part (11e) of the first part (11) with end edges (12e) directly connected to an inner wall of the grounded chamber (10). The surface of the antenna (1) is covered with an electrically insulating material. The frequency of the high-frequency power applied to the antenna may be as high as approximately 40MHz to several 100MHz, and desired plasma can be generated by suppressing problems such as abnormal electrical discharge and matching failure. The equipment can be also constituted for process of film formation and the like.

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Inventors:

ONODA MASATOSHI (JP)
TAKAHASHI EIJI (JP)

Application Number:

PCT/JP2005/005664

Publication Date:

October 06, 2005

Filing Date:

March 22, 2005

Export Citation:

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Assignee:

NISSIN ELECTRIC CO LTD (JP)
ONODA MASATOSHI (JP)
TAKAHASHI EIJI (JP)

International Classes:

C23C16/24; C23C16/509; C23F4/00; H01J37/32; H01L21/205; H01L21/3065; H05H1/46; (IPC1-7): H05H1/46; C23C16/509; C23F4/00; H01L21/205; H01L21/3065

Domestic Patent References:

WO2001088221A1

2001-11-22

Foreign References:

JP2004039719A	2004-02-05
JP2000345351A	2000-12-12
JP2002217119A	2002-08-02

Other References: