PLASMA GENERATION APPARATUS - KOREA RES INST STANDARDS & SCI

Title:

PLASMA GENERATION APPARATUS

Document Type and Number:

WIPO Patent Application WO/2018/128339

Kind Code:

A1

Abstract:

A plasma generation apparatus according to an embodiment of the present invention includes a plasma generation unit. The plasma generation unit has a spherical or ellipsoidal cavity. The plasma generation unit generates plasma by receiving a supply of RF power in the cavity so that electrons recoil and resonate. The cavity includes a plasma extraction hole so that the cavity is connected to an external space.

More Like This:

JP5165821	Multi-coil antenna for inductively coupled plasma generation systems
WO/2022/260827	PLASMA UNIFORMITY CONTROL IN PULSED DC PLASMA CHAMBER
JPH02308529	METHOD AND DEVICE FOR HEATING OR COOLING SEMICON DUCTOR WAFER IN SEMICON DUCTOR WAFER PROCESSOR

Inventors:

LEE HYO CHANG (KR)
KIM JUNG-HYUNG (KR)
SEONG DAE-JIN (KR)

Application Number:

PCT/KR2018/000008

Publication Date:

July 12, 2018

Filing Date:

January 02, 2018

Export Citation:

Click for automatic bibliography generation Help

Assignee:

KOREA RES INST STANDARDS & SCI (KR)

International Classes:

H01J37/32; H05H1/46

Foreign References:

KR100716263B1	2007-05-08
KR20080110967A	2008-12-22
JP2016063221A	2016-04-25
KR20110118206A	2011-10-31

Other References:

OLEG V. POLOMAROV,. ET AL.: "Enhanced collisionless heating in a nonuniform plasm a at the bounce resonance condition", PHYSICS OF PLASMAS, vol. 12, no. 8, 12 August 2005 (2005-08-12), Retrieved from the Internet

Attorney, Agent or Firm:

NURY PATENT LAW FIRM (KR)

Download PDF:

View/Download PDF PDF Help

Previous Patent: PASSIVELY-OPERATED CORIUM COOLING APPARATUS

Next Patent: METHOD FOR CHANNEL STATE REPORTING IN WIRELESS COMMUNICATION SYSTEM AND APPARATUS FOR SAME