Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PLASMA GENERATION DEVICE INCLUDING MATCHING DEVICE, AND IMPEDANCE MATCHING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/093728
Kind Code:
A1
Abstract:
.The present invention relates to a plasma generation device including a matching device which connects an RF power source and an antenna-plasma device and matches the impedances thereof, and a matching method. The plasma generation device comprises: an RF power source unit which receives RF power for generating plasma; a load device unit provided with a standard load which has a preset impedance and an antenna-plasma device for generating plasma according to the RF power; and a matching unit which connects the RF power source unit to either the antenna-plasma device or the standard load, and matches the impedances of the RF power source unit and the antenna-plasma device when the antenna-plasma device is connected to the RF power source unit, wherein the matching unit, before connecting the antenna-plasma device and the RF power source unit, connects the standard load and the RF power source unit in order to detect a parasitic impedance according to a parasitic component in a circuit, connects the antenna-plasma device rather than the standard load when the parasitic impedance is detected, calculates the reactance needed to match the impedances on the basis of the detected parasitic impedance, and changes the capacitances of capacitors in the matching unit according to the calculated reactance.

Inventors:
KIM, Sunho (#1107-1004, 75 Doum 3-ro, Sejong, 30064, KR)
JUNG, Bongki (#106-705, 448 Expo-ro,,Yuseong-gu, Daejeon, 34049, KR)
Application Number:
KR2018/013310
Publication Date:
May 16, 2019
Filing Date:
November 05, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
KOREA ATOMIC ENERGY RESEARCH INSTITUTE (111 Daedeok-daero 989beon-gil, Yuseong-gu, Daejeon, 34057, KR)
International Classes:
H05H1/46
Foreign References:
KR101570171B12015-11-20
KR20140070068A2014-06-10
KR101124770B12012-03-23
KR20110100595A2011-09-14
Other References:
LEON P. BARKER: "RF discharge impedance measurements using a new method to determine the stray impedances", IEEE TRANSACTIONS ON PLASMA SCIENCE, vol. 27, no. 3, 30 June 1999 (1999-06-30), pages 759 - 765, XP011045295
Attorney, Agent or Firm:
PARK, Jang-Won (2nd-3rd Fl, 566, Gangnam-daero,Gangnam-gu, Seoul, 06044, KR)
Download PDF: