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Patent Searching and Data


Title:
PLASMA HEATING APPARATUS AND METHODS
Document Type and Number:
WIPO Patent Application WO2003096747
Kind Code:
A3
Abstract:
Apparatus and methods for plasma-assisted heating are provided. In one embodiment, a heating apparatus can include a cavity (14) for containing a gas. The cavity can have a thermally conductive wall and a radiation-transmissive wall. At least one electromagnetic radiation source (26) can be used to irradiate the gas in the cavity to ignite plasma in the cavity. The heating apparatus can also include a heating region located external to the cavity and adjacent the thermally conductive wall. Various plasma catalysts are also provided.

Inventors:
KUMAR SATYENDRA (US)
KUMAR DEVENDRA (US)
Application Number:
PCT/US2003/014133
Publication Date:
February 19, 2004
Filing Date:
May 07, 2003
Export Citation:
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Assignee:
DANA CORP (US)
KUMAR SATYENDRA (US)
KUMAR DEVENDRA (US)
International Classes:
A62D3/00; B01J7/00; B01D53/86; B01D53/92; B01J19/08; B01J19/12; B01J37/34; B22F3/105; C01B3/02; C21D1/06; C21D1/09; C21D1/38; F01N3/08; F01N3/10; F01N3/20; F01N3/24; F01N3/28; F01N3/30; F01N9/00; F27B17/00; F27D3/12; F27D11/08; F27D11/12; G21K5/00; H01J37/32; H01M8/06; H05B6/68; H05B6/78; H05B6/80; H05H1/24; H05H1/46; C22B4/00; F01N13/10; (IPC1-7): B23K10/00
Foreign References:
US4307277A1981-12-22
US5164130A1992-11-17
US5202541A1993-04-13
US6297172B12001-10-02
US5651825A1997-07-29
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