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Title:
PLASMA IRRADIATION APPARATUS AND PLASMA IRRADIATION METHOD
Document Type and Number:
WIPO Patent Application WO/2016/163007
Kind Code:
A1
Abstract:
Provided are a plasma irradiation apparatus and plasma irradiation method capable of converting a silica precursor to a high quality silica film in a short time without thermal effects on the object being processed. This plasma irradiation apparatus 1 is provided with a plasma-generating unit 12 and an irradiation unit 80 for irradiating the plasma generated by the plasma-generating unit 12 on an object to be processed, and is characterized in that said irradiation unit 80 comprises a coating part 85 capable of coating a liquid on the object being processed.

Inventors:
SHINDO, Toyohiko (1880-2-306 Kamimizo, Chuo-ku, Sagamihara-sh, Kanagawa 43, 〒2520243, JP)
GENBA, Yumino (4-15-14, Kitashiro-cho Joetsu-sh, Niigata 24, 〒9430824, JP)
YAMAGUCHI, Masuji (1880-2-306 Kamimizo, Chuo-ku, Sagamihara-sh, Kanagawa 43, 〒2520243, JP)
Application Number:
JP2015/061135
Publication Date:
October 13, 2016
Filing Date:
April 09, 2015
Export Citation:
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Assignee:
ORAL 28 INC. (1880-2-306, Kamimizo Chuo-ku, Sagamihara-sh, Kanagawa 43, 〒2520243, JP)
International Classes:
B01J19/08; A61C5/77; C01B33/12; H05H1/24
Domestic Patent References:
WO2004064129A12004-07-29
Foreign References:
JP2010523814A2010-07-15
JP2010137372A2010-06-24
JP2014240462A2014-12-25
Other References:
See also references of EP 3281694A4
Attorney, Agent or Firm:
SHOBAYASHI, Masayuki (Sapia Tower, 1-7-12 Marunouchi, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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