Title:
PLASMA NITRIDING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2015/093167
Kind Code:
A1
Abstract:
This plasma nitriding apparatus is provided with: a surface treatment section (10), which includes a treatment tank (11) that contains a part of a subject to be treated (1) that includes a surface treatment region (2), and which nitrides, in the treatment tank (11), the surface treatment region (2) by means of plasma of a treatment gas (30); and an outer container (20), which is supplied with the treatment gas (30), and which contains the subject to be treated (1) and the treatment tank (11) in a state wherein subject to be treated (1) parts other than the part are exposed from the treatment tank (11).
Inventors:
KAMEYA NORIMITSU (JP)
FUCHIGAMI KENJI (JP)
FUCHIGAMI KENJI (JP)
Application Number:
PCT/JP2014/079303
Publication Date:
June 25, 2015
Filing Date:
November 05, 2014
Export Citation:
Assignee:
IHI CORP (JP)
International Classes:
C23C8/36
Foreign References:
| JPH02213460A | 1990-08-24 | |||
| JPH08158038A | 1996-06-18 | |||
| JPS3517303B1 | ||||
| JPS5298633A | 1977-08-18 | |||
| JP2011084793A | 2011-04-28 |
Other References:
See also references of EP 3085807A4
Attorney, Agent or Firm:
MIYOSHI, Hidekazu et al. (JP)
Hidekazu Miyoshi (JP)
Hidekazu Miyoshi (JP)
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