Title:
PLASMA PROCESS MONITORING METHOD, PLASMA PROCESS MONITORING DEVICE, AND PLASMA GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/158227
Kind Code:
A1
Abstract:
A plasma generation device according to one embodiment may comprise: a chamber in which plasma is generated; at least one sensor arranged inside the chamber; a voltage application unit for applying, to the sensors, three or more sinusoidal voltages having different frequencies; a measurement circuit unit for measuring output current flowing in the sensors; and a data processing unit for calculating the thickness of a dielectric inside the chamber on the basis of information about the sinusoidal voltages and information about the output currents.
Inventors:
CHUNG CHIN WOOK (KR)
SEO BEOM JUN (KR)
SEO BEOM JUN (KR)
Application Number:
PCT/KR2023/002230
Publication Date:
August 24, 2023
Filing Date:
February 15, 2023
Export Citation:
Assignee:
IUCF HYU (KR)
International Classes:
H01J37/32
Foreign References:
| KR20090066587A | 2009-06-24 | |||
| KR101447639B1 | 2014-10-08 | |||
| KR20080001163A | 2008-01-03 | |||
| KR20160090940A | 2016-08-02 | |||
| KR101206744B1 | 2012-11-30 |
Other References:
CHOI JAE-HOON: "Abstract: KW81.00023 : Real-time measurement of dielectric thickness on a millimeter scale using triple-frequency in inductively coupled plasma", 74TH ANNUAL GASEOUS ELECTRONICS CONFERENC, vol. 66, 6 October 2021 (2021-10-06) - 8 October 2021 (2021-10-08), XP093085273
Attorney, Agent or Firm:
HAEUM PATENT & LAW FIRM (KR)
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