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Title:
PLASMA PROCESSING APPARATUS AND FILTER UNIT
Document Type and Number:
WIPO Patent Application WO/2022/202702
Kind Code:
A1
Abstract:
A plasma processing apparatus comprising: a processing vessel in which plasma processing is performed; an external circuit electrically connected, via a line, to an electrical member provided inside the processing vessel; and a filter unit provided on the line. The filter unit includes a first filter provided on the electrical member side, a second filter provided on the external circuit side and connected in series to the first filter, and a housing containing the first filter and the second filter. The first filter includes an air core coil. The second filter includes a coil with a toroidal core. The toroidal core is made of an Mn-Zn-based ferrite or a nanocrystal soft magnetic material.

Inventors:
NAGASHIMA NOZOMU (JP)
KATAOKA TAKESHI (JP)
Application Number:
PCT/JP2022/012789
Publication Date:
September 29, 2022
Filing Date:
March 18, 2022
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01F17/06; H01L21/3065; H01L21/31; H03H7/01; H03H7/075; H05H1/46
Domestic Patent References:
WO2020060722A12020-03-26
Foreign References:
JP2014056706A2014-03-27
JP2007266533A2007-10-11
JP2020503676A2020-01-30
JP2014229565A2014-12-08
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
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