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Title:
PLASMA PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2008/065744
Kind Code:
A1
Abstract:
Above an object to be processed, n coil elements (n is two or more integer) having the same shape are arranged axial-symmetrically with respect to an axis which is normal of the surface of the object, and the coil elements are electrically connected parallel to one another to form an induction coil. Each coil element is a circle whose center is the above axis, has a ground end and a feed end just above the ground end in the same point when the coil is projected onto the projection plane of the object. The coil element comprises a lower surface part having the ground end at one end, a predetermined width, and an arc shape the center angle of which is 360°/n and a feed part having the feed end at one end, a predetermined width, and an arc shape, and is disposed at a level higher than that of the lower surface part, and electrically connected to the lower surface part. Such coil elements can be so combined that the feed end of one coil element is just above the ground end of another coil element.

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Inventors:
NAKAGAMI SHINJI (JP)
NAKANO HIROHIKO (JP)
Application Number:
PCT/JP2007/001284
Publication Date:
June 05, 2008
Filing Date:
November 21, 2007
Export Citation:
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Assignee:
SAMCO INC (JP)
NAKAGAMI SHINJI (JP)
NAKANO HIROHIKO (JP)
International Classes:
H05H1/46; C23C16/507; H01L21/205; H01L21/3065
Foreign References:
JP2005303053A2005-10-27
JP2006216903A2006-08-17
JP2005534185A2005-11-10
JP2001052894A2001-02-23
JPH1192968A1999-04-06
JPH08279493A1996-10-22
Attorney, Agent or Firm:
KOBAYASI, Ryohei (7th Floor Hougen-Sizyokarasuma Building,37, Motoakuozi-tyo, Higasinotouin,Sizyo-sagaru, Simogyo-ku, Kyoto-s, Kyoto 91, JP)
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