Title:
PLASMA PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2018/173892
Kind Code:
A1
Abstract:
The present invention improves the uniformity of a plasma by suppressing plasma generation between antennas in a plasma processing apparatus that has a plurality of linear antennas. A plasma processing apparatus (100) which generates a plasma P within a vacuum container (2) by supplying a high-frequency current to a plurality of antennas (3) that are arranged within the vacuum container (2), and which processes a substrate W with use of the plasma P. Each one of the plurality of antennas (3) has a linear shape; and the plurality of antennas (3) are arranged in parallel with each other. A dielectric member (14) is arranged between adjacent antennas (3) so as to extend along the antennas (3), and the dielectric member (14) suppress plasma generation between the antennas (3).
Inventors:
SAKAI TOSHIHIKO (JP)
FUJIWARA MASAKI (JP)
NAKATA SEIJI (JP)
FUJIWARA MASAKI (JP)
NAKATA SEIJI (JP)
Application Number:
PCT/JP2018/010036
Publication Date:
September 27, 2018
Filing Date:
March 14, 2018
Export Citation:
Assignee:
NISSIN ELECTRIC CO LTD (JP)
International Classes:
H05H1/46; C23C16/509; H01L21/3065; H01L21/31
Domestic Patent References:
| WO2013032406A1 | 2013-03-07 |
Foreign References:
| JP2008251838A | 2008-10-16 | |||
| JP2015193863A | 2015-11-05 | |||
| JP2012007239A | 2012-01-12 | |||
| JP2013175480A | 2013-09-05 | |||
| JP2016072168A | 2016-05-09 | |||
| JP2015041575A | 2015-03-02 | |||
| US20110018443A1 | 2011-01-27 |
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