Title:
PLASMA PROCESSING DEVICE, INTERNAL MEMBER FOR PLASMA PROCESSING DEVICE, AND METHOD FOR MANUFACTURING SAID INTERNAL MEMBER
Document Type and Number:
WIPO Patent Application WO/2020/208801
Kind Code:
A1
Abstract:
Provided are: a plasma processing device which suppresses the contamination of samples and improves processing yield; an internal member for a plasma processing device; and a method for manufacturing said internal member. A plasma processing device that uses plasma, which is formed from a processing gas supplied into a processing chamber inside a vacuum vessel, to process a to-be-processed wafer that has been placed in the processing chamber, wherein the surface of a member disposed inside the processing chamber and facing the plasma is formed from a dielectric material, and the dielectric material includes a first material which chemically combines with the supplied processing gas and is volatilized, and a second material in which the volume of a non-volatile compound that is generated by the second material chemically combining with the processing gas is greater than before the chemical combination.
Inventors:
TAMURA TOMOYUKI (JP)
IKENAGA KAZUYUKI (JP)
IKENAGA KAZUYUKI (JP)
Application Number:
PCT/JP2019/015912
Publication Date:
October 15, 2020
Filing Date:
April 12, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01L21/3065; B01J19/08; C23C4/11; C23C24/04
Foreign References:
| JP2007321183A | 2007-12-13 |
Attorney, Agent or Firm:
IWASAKI Shigemi (JP)
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