Title:
PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD, AND CONDUCTIVE MEMBER
Document Type and Number:
WIPO Patent Application WO/2020/189545
Kind Code:
A1
Abstract:
This plasma processing device is provided with: a chamber including a first member, and a second member capable of being attached to and removed from the first member; a conductive member disposed between the first member and the second member; and a first high-frequency power source for generating plasma in the chamber. The conductive member includes a resin member comprising a resin material, and a metal film provided on the surface of the resin member.
Inventors:
YOKOTA MASAHIRO (JP)
HAPPOYA AKIHIKO (JP)
TAKAHASHI KEN (JP)
MORITA SHUSUKE (JP)
OSHIMA JIRO (JP)
SAITO SHUICHI (JP)
YAGI NORIAKI (JP)
SASAKI ATSUYA (JP)
HAPPOYA AKIHIKO (JP)
TAKAHASHI KEN (JP)
MORITA SHUSUKE (JP)
OSHIMA JIRO (JP)
SAITO SHUICHI (JP)
YAGI NORIAKI (JP)
SASAKI ATSUYA (JP)
Application Number:
PCT/JP2020/011050
Publication Date:
September 24, 2020
Filing Date:
March 13, 2020
Export Citation:
Assignee:
NOA LEADING CO LTD (JP)
TOSHIBA MATERIALS CO LTD (JP)
TOSHIBA MATERIALS CO LTD (JP)
International Classes:
H05H1/46; H01L21/3065
Domestic Patent References:
| WO2014184824A1 | 2014-11-20 |
Foreign References:
| JPH04269822A | 1992-09-25 | |||
| JP2008060148A | 2008-03-13 |
Attorney, Agent or Firm:
HYUGAJI, Masahiko et al. (JP)
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