Title:
PLASMA PROCESSING DEVICE AND POWER SUPPLY SYSTEM
Document Type and Number:
WIPO Patent Application WO/2024/070578
Kind Code:
A1
Abstract:
Provided is technology for improving the controllability of plasma generated on a substrate. This plasma processing device includes: a chamber; a substrate support part provided within the chamber, the substrate support part including a lower electrode; an upper electrode disposed above the substrate support part; a first RF power supply configured to supply a first RF signal having a first RF frequency to the upper electrode or to the lower electrode; a second RF power supply configured to supply a second RF signal having a second RF frequency to the lower electrode; and a third RF power supply configured to supply a third RF signal having a third RF frequency to the lower electrode. The three RF power supplies supply RF signals at respective electric power levels in three periods within respective cycles.
Inventors:
IWANO MITSUHIRO (JP)
NORO MOTOKI (JP)
NORO MOTOKI (JP)
Application Number:
PCT/JP2023/032784
Publication Date:
April 04, 2024
Filing Date:
September 08, 2023
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/3065; H05H1/46
Foreign References:
| JP2022048811A | 2022-03-28 | |||
| JP2022115719A | 2022-08-09 | |||
| JP2021182620A | 2021-11-25 | |||
| JP2021182619A | 2021-11-25 | |||
| JP2017174538A | 2017-09-28 | |||
| JP2013535074A | 2013-09-09 | |||
| JP2021141050A | 2021-09-16 |
Attorney, Agent or Firm:
SATO, Atsushi et al. (JP)
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