Title:
PLASMA PROCESSING DEVICE AND TOP WALL
Document Type and Number:
WIPO Patent Application WO/2021/070636
Kind Code:
A1
Abstract:
Provided is a plasma processing device that converts into plasma a gas supplied to the interior of a processing container and processes a substrate, the device including: microwave introduction windows, which are disposed at a plurality of openings provided in a top wall of the processing container and which supply microwave power to the interior of the processing container; and grooves that are formed in the top wall so as to surround the openings. The width between the grooves and the openings is not uniform in relation to the circumferential direction of the openings.
Inventors:
ITOH SATOSHI (JP)
IMANAKA MASASHI (JP)
KAMATA EIKI (JP)
IKEDA TARO (JP)
OZAKI SHIGENORI (JP)
EMORI SOUDAI (JP)
IMANAKA MASASHI (JP)
KAMATA EIKI (JP)
IKEDA TARO (JP)
OZAKI SHIGENORI (JP)
EMORI SOUDAI (JP)
Application Number:
PCT/JP2020/036334
Publication Date:
April 15, 2021
Filing Date:
September 25, 2020
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H05H1/46; C23C16/511; H01L21/205; H01L21/3065; H01L21/31
Domestic Patent References:
| WO2008153064A1 | 2008-12-18 | |||
| WO2008153054A1 | 2008-12-18 |
Foreign References:
| JP2006040638A | 2006-02-09 | |||
| JP2015231050A | 2015-12-21 | |||
| JP2009301802A | 2009-12-24 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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