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Patent Searching and Data


Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2007/034747
Kind Code:
A1
Abstract:
[PROBLEMS] To provide an atmospheric pressure plasma treatment device capable of coping with a large area of an object to be treated and assuring preferable treatment at a normal discharge treatment start point. [MEANS FOR SOLVING PROBLEMS] A first metal surface (21a) of a first stage unit (21) of a stage (20) of an atmospheric pressure plasma processing device is exposed and a dielectric work (W) to be treated is placed. A second stage unit (22) is arranged at the periphery of the first stage unit (21). A solid dielectric layer (25) is arranged on a second metal (24) of the second stage unit (22) and the peripheral portion of the work (W) to be treated is placed in an internal dielectric portion (26) of the solid dielectric layer (25). An electrode (11) forms a run-up discharge (D2) in a second movement range (R2) on the second stage unit (22) and moves to a first movement range (R1) on the first stage unit (21) to form a normal plasma discharge (D1).

Inventors:
NAKAJIMA SETSUO (JP)
TAKEUCHI TOSHIMASA (JP)
MATSUZAKI JUNICHI (JP)
MAYUMI SATOSHI (JP)
NISHIKAWA OSAMU (JP)
SAITO NAOMICHI (JP)
NAKANO YOSHINORI (JP)
FUKUSHI MAKOTO (JP)
FURUNO YOSHIHIKO (JP)
Application Number:
PCT/JP2006/318381
Publication Date:
March 29, 2007
Filing Date:
September 15, 2006
Export Citation:
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Assignee:
SEKISUI CHEMICAL CO LTD (JP)
NAKAJIMA SETSUO (JP)
TAKEUCHI TOSHIMASA (JP)
MATSUZAKI JUNICHI (JP)
MAYUMI SATOSHI (JP)
NISHIKAWA OSAMU (JP)
SAITO NAOMICHI (JP)
NAKANO YOSHINORI (JP)
FUKUSHI MAKOTO (JP)
FURUNO YOSHIHIKO (JP)
International Classes:
H05H1/24; C23C16/50
Foreign References:
JP2003257948A2003-09-12
JP2004172365A2004-06-17
JP2003133291A2003-05-09
JP2003036996A2003-02-07
Attorney, Agent or Firm:
WATANABE, Noboru et al. (7-7 Kudanminami 3-chom, Chiyoda-ku Tokyo 74, JP)
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